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HL-X860/1200 CTP/PS Thermal Plate Processor

HL-X860/1200 CTP/PS Thermal Plate Processor Controlled by computer, the CTP Thermal Plate Processor finish developing washing, gumming and drying in one cycle automatically. Ultralong developing process and exact temperature control ensure the dots real and even.. 1. Extended develop section and two special hair-brush providing stability, even and thoroughly of place developing. Best for fast expo ...
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  • PRODUCT DETAIL
  • Features

HL-X860/1200 CTP/PS Thermal Plate Processor Controlled by computer, the CTP Thermal Plate Processor finish developing washing, gumming and drying in one cycle automatically. Ultralong developing process and exact temperature control ensure the dots real and even..

1. Extended develop section and two special hair-brush providing stability, even and thoroughly of place developing. Best for fast exposing type Thermal plates.

2. Precise Homoiothermy system for developing liquid can control the developing-liquid temperature effectually. The error is less than 0.5℃.

3. Developing liquid cycle system skillfully screen out dirt and impurities, ensure the plate clean.

4. All the parameter and procedure is controlled by computer, exact and reliable. Spraying-water come with plate and stop water when plate go. It wish gumming roller automatically, avoid solidifying glue and gumming-roller solid.

The parameter such as developing speed, brush rotation speed and temperature can be digitization display.

HL-X860/1200 CTP/PS Thermal Plate Processor

Detailed Data:

 ModelXCTP860XCTP1200
Max.plate.width860mm1200mm
Drying temp30℃-60℃
Min.plate.length350mm
Plate.thinckness0.15-0.4mm
Develop speed20-60s
Develop temperature15℃-40℃
Develop liter20L25L
Power supply1φ/AC22V/30A
L×W×H(mm)2520×980×10002520×1180×1000
Net weight380Kg560Kg

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